Fetching the paper…
Reading the bibliography…
In this work we introduce an open-ended question benchmark, ALDbench, to evaluate the performance of large language models (LLMs) in materials synthesis, and in particular in the field of atomic layer deposition, a thin film growth technique used in energy applications and microelectronics.
J. B. Kim, D. R. Kwon, K. Chakrabarti, C. Lee, K. Y. Oh, and J. H. Lee, “Improvement in Al2O3 dielectric behavior by using ozone as an oxidant for the atomic layer deposition technique,” Journal of Applied Physics 92
2002
Earlier work this paper cites.
T. Pilvi, T. Hatanpää, E. Puukilainen, K. Arstila, M. Bischoff, U. Kaiser, N. Kaiser, M. Leskelä, and M. Ritala, “Study of a novel ALD process for depositing MgF2 thin films,” J. Mater. Chem. 17
2007
Earlier work this paper cites.
S. M. George, “Atomic layer deposition: An overview,” Chemical Reviews 110
2010
Earlier work this paper cites.
Y. Lee, H. Sun, M. J. Young, and S. M. George, “Atomic layer deposition of metal fluorides using HF–pyridine as the fluorine precursor,” Chemistry of Materials 28
2016
Earlier work this paper cites.
M. F. J. Vos, H. C. M. Knoops, R. A. Synowicki, W. M. M. Kessels, and A. J. M. Mackus, “Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma,” Applied Physics Letters 111
2017
Earlier work this paper cites.
E. Alvaro and A. Yanguas-Gil, “Characterizing the field of atomic layer deposition: Authors, topics, and collaborations,” PLOS ONE 13
2018
Cited alongside, same era.
N. Hornsveld, W. M. M. Kessels, R. A. Synowicki, and M. Creatore, “Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma,” Phys. Chem. Chem. Phys. 23
2021
Cited alongside, same era.
J. Kim, D. Shim, Y. Kim, and H. Chae, “Atomic layer etching of Al2O3 with NF3 plasma fluorination and trimethylaluminum ligand exchange,” Journal of Vacuum Science & Technology A 40
2022
Cited alongside, same era.
A. D. White, “The future of chemistry is language,” Nature Reviews Chemistry 7
2023
Cited alongside, same era.
D. A. Boiko, R. MacKnight, B. Kline, and G. Gomes, “Autonomous chemical research with large language models,” Nature 624
2023
Cited alongside, same era.
2023
Later among the works it cites.
2024
Closest in time.
K. M. Jablonka, P. Schwaller, A. Ortega-Guerrero, and B. Smit, “Leveraging large language models for predictive chemistry,” Nature Machine Intelligence 6
2024
Closest in time.
alphaXiv searches the wider corpus for related work and actual follow-ups.
alphaXiv is searching for related work…
“Atomic limits ald database,”
Cited in the paper.
2024
Closest in time.
A. M. Bran, S. Cox, O. Schilter, C. Baldassari, A. D. White, and P. Schwaller, “Augmenting large language models with chemistry tools,” Nature Machine Intelligence 6
2024
Closest in time.